Fashion Institute of Technology FIT
Specialisms: Apparel / Atelier - Pattern Cutting / Denim
Location: New York, United States
First Name: delaney
Last Name: slattery
Specialisms: Apparel / Atelier - Pattern Cutting / Denim
Sectors:
My Location: New York, United States
University / College: Fashion Institute of Technology FIT
Course / Program Title: Fashion Design MFA
Delaney Hope Slattery is an American fashion designer who holds a Fashion Design MFA from the Fashion Institute of Technology, and a Fashion Design & Product Innovation BS from the University of Delaware. Grounded by her Parisian studies abroad in construction and tailored draping, she excels in craftsmanship and a hands-on approach to making. Through the convergence of art and ready-to-wear fashion, the world of Delaney Slattery revolves on the axis where craftsmanship meets wearability – fashions that bring too-often rationed luxuries into everyday contexts.
Kriah, the Jewish death ritual of tearing one’s clothing as an expression of grief, grounds this graduate thesis collection. Delaney’s work is informed by three frameworks of research: an autoethnographic study of the loss of her Nana and Poppy; an exploration of sharpness in Memento Mori artwork; and an examination of the dizzying nature of grief. Through the repurposing of familial textiles, mending stitches, and hand-torn satins, this collection honors the nuances of Kriah and the ritualistic nature of mourning.